| B | Boron; Flux density |
| B2O3 | Boric oxide |
| Ba | Barium |
| BACT | Best Available Control Technology |
| BASE | Boston Area Semiconductor Education (Council) |
| Baud | Signal level changes |
| BAW | Bulk Acoustic Wave |
| BC | Bias Contrast; Bond Centered; Buired Capacitance |
| BCAD | Business Computer-Aided Design |
| BCC | Body Centered Cubic |
| BCD | Binary Coded Decimal |
| BCP | Biphase Communications Processor |
| BCS | Bardeen Cooper Schriefer |
| BDEV | Behavior-level DEViation |
| BDMA | BenzylDiMethylAmine |
| BDS | Brownian Dynamics Simulation |
| Be | Beryllium |
| BE | Boundary Element; Bound Exciton; Band Edge |
| BEC | Bose Einstein Condensation |
| BEEM | Ballistic Electron Emmission Spectroscopy |
| BEEP | Block Extensible Exchange Protocol |
| BEM | BE Method |
| BENU | Bull's Eye Non-Uniformity |
| BEOL | Back-End Of Line |
| BER | Bit Error Rate |
| BESOI | Bonded and Etchback SOI |
| BET | Brunauer, Emmett, Teller |
| BF | Brightfield |
| BFGS | Broyden-Fletcher-Goldfarb-Shanno optimization algorithm |
| BFL | Buffered Field-effect-transistor Logic |
| BFO | Beat Frequency Oscillator |
| BG | Band Gap |
| BGA | Ball Grid Array |
| BGE | Band Gap Engineering |
| BHF | Buffered Hydro Fluoric (acid) |
| BHT | Brinell Hardness Test |
| Bi | Bismuth |
| BI | Burn In |
| BICMOS | Bipolar Complementary Metal-Oxide Semiconductor |
| BIFET | Bipolar Field-Effect Transistor |
| BIM | Binary Intensity Mask |
| BIMOS | Bipolar Metal-Oxide Semiconductor |
| BIS | Built-In Simulation |
| BIST | Built-In Self Test |
| BIT | Bulk Ion Temperature |
| BITE | Built-In Test Equipment |
| Bk | Berkelium |
| BLD | Beam Lead Device |
| BLEVE | Boiling Liquid Expanding Vapor Explosion |
| BMC | Bubble Memory Controller |
| BMP | Windows or OS/2 Bitmap image format |
| BOD | Biochemical Oxygen Demand |
| BOE | Buffered Oxide Etchant |
| BOM | Bill Of Material |
| BOR | Bottom Of Range |
| BOSS | Book Of SEMI Standards; Binary Object Storage System |
| BOX | Buried OXide |
| BPF | Band Pass Filter |
